ISSN : 1738-4125(Print)
ISSN : 2287-7509(Online)
ISSN : 2287-7509(Online)
반도체 클린룸용 에어와셔 시스템의 열회수, 집진 및 가스제거 특성
An Experiment on the Characteristics of Heat Recovery, Particle Collection and Gas Removal in an Air Washer System for Semiconductor Clean Rooms
Abstract
In recent models of semiconductor manufacturing clean rooms, air washers are used to remove airbornegaseous contaminants such as NH3, SOx and organic gases introduced from outdoor air into clean room.Meanwhile, there is a large quantity of exhaust air produced from clean room. It is desirable to recover heatfrom exhaust air and use it to reheat outdoor air. In the present study, an experiment was conducted toinvestigate heat recovery, particle collection, and gas removal in a heat recovery type air washer system forsemiconductor manufacturing clean rooms.
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